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ISO 1000KW Plasma Enhanced Chemical Vapor Deposition System

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ISO 1000KW Plasma Enhanced Chemical Vapor Deposition System

Brand Name : XDEM

Model Number : XDEM-1200T-PECVD

Certification : ISO, CE

Place of Origin : China

MOQ : 1 set

Price : $380-5900 US dollars/set

Payment Terms : L/C, T/T, Western Union, MoneyGram

Supply Ability : 60 sets per month

Delivery Time : 15 working days

Packaging Details : wooden box with polyfoam filled all sides

Max. temperature : 1200C

Working temperature : not more than 1100C

Heating rate : 0-20'C

Temperature uniformity : ±5℃

tube diameter : customer size

Heating Element : Resistance wire with Mo

Temperature Control : PID automatic control via SCR power control

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Plasma Enhanced Chemical Vapor Deposition PECVD System Machine

PECVD system, by ionizing atom-containing gas with microwave or radio frequency, create active plasma locally, which will react easily to deposit and form the expected thin film. It is suitable for the PECVD process, such as silicon carbide coating ceramic substrate conductivity test, controlled growth of ZnO nanostructures, ceramic capacitors(MLCC) atomosphere sintering experiment,etc.

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ISO 1000KW Plasma Enhanced Chemical Vapor Deposition System

ISO 1000KW Plasma Enhanced Chemical Vapor Deposition System

ISO 1000KW Plasma Enhanced Chemical Vapor Deposition System

Packing & Shipping:

Wooden box with polyfoam filled inside to ensure safe transportation.

ISO 1000KW Plasma Enhanced Chemical Vapor Deposition System

Parcels can be sent by sea, by air, by express,etc per customer's request.


Product Tags:

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